Ion implantation : science and technology

Ion Implantation Science and Technology: Second Edition, just like the first edition, serves as both an introduction and tutorial to the science, techniques, and machines involved in the subject. The book is divided into two parts - Part 1: Ion Implantation Science and Part 2: Ion Implantation Technology. Part 1 covers topics such as the stopping and range of ions in solids; ion implantation damage in silicon; experimental annealing and activation; and the measurement on ion implantation. Part 2 includes ion optics and focusing on implanter design; photoresist problems and particle contamination; ion implantation diagnostics and process control; and emission of ionizing radiation from ion implanters. The text is recommended for engineers who would like to be acquainted with the principles and processes behind ion implantation or make studies on the field. Content: Front Matter , Page iii Copyright , Page iv Contributors , Pages vii-viii Preface , Page ix , J.F. Ziegler THE STOPPING AND RANGE OF IONS IN SOLIDS , Pages 3-61 , J.F. Ziegler ION IMPLANTATION DAMAGE IN SILICON , Pages 63-92 , Siegfried Mader EXPERIMENTAL ANNEALING AND ACTIVATION , Pages 93-163 , JOZSEF GYULAI MEASUREMENT OF ION IMPLANTATION , Pages 165-218 , P.L.F. Hemment An INTRODUCTION TO ION SOURCES , Pages 221-289 , Ken G. Stephens ION OPTICS AND FOCUSSING IN IMPLANTER DESIGN , Pages 291-312 , Kenneth H. Purser, Nicholas R. White Wafer Cooling, Faraday Design and Wafer Charging , Pages 313-344 , M.E. Mack PHOTORESIST PROBLEMS AND PARTICLE CONTAMINATION , Pages 345-375 , T.C. Smith Ion Implantation Diagnostics and Process Control , Pages 377-413 , M.I. Current, C.B. Yarling, W.A. Keenan SAFETY CONSIDERATIONS FOR ION IMPLANTERS , Pages 415-439 , H. Ryssel, P. Hamers EMISSION OF IONIZING RADIATION FROM ION IMPLANTERS , Pages 441-489 , Constantine J. Maletskos, William R. Ghen INDEX , Pages 491-498