Scanning Probe Lithography : Fundamentals, Materials, and Applications

The most complete book available on scanning probe lithography (SPL), this work details the modalities, mechanisms, and current technologies, applications, and materials on which SPL can be performed. It provides a comprehensive overview of this versatile and cost-effective technique, which does not require clean room conditions and can be performed in any lab or industry facility to achieve highresolution and high-quality patterns on a wide range of materials: biological, semiconducting, polymers, and 2D materials.• Introduces historical background of SPL, including evolution of the technique and tools • Explains the mechanism of sample modifcation/manipulation, types of AFM tips, technical parts of the experimental setup, and materials on which the technique can be applied • Shows the different types of devices and structures fabricated by SPL, together with the processing steps • Contains a complete and state-of-the art package of examples and different approaches, performed by different international research groups • Summarizes strengths, limitations, and potential of SPL This book is aimed at advanced students, technicians, and researchers in materials science, microelectronics, and others working with lithographic techniques and fabrication processes.MATLAB® is a trademark of The MathWorks, Inc. and is used with permission. The MathWorks does not warrant the accuracy of the text or exercises in this book. This book's use or discussion of MATLAB® software or related products does not constitute endorsement or sponsorship by The MathWorks of a particular pedagogical approach or particular use of the MATLAB® software. The most complete book available on scanning probe lithography (SPL), this work details the modalities, mechanisms, and current technologies, applications, and materials on which SPL can be performed. It provides a comprehensive overview of this versatile and cost-effective technique, which does not require clean room conditions and can be performed in any lab or industry facility to achieve high-resolution and high-quality patterns on a wide range of materials: biological, semiconducting, polymers, and 2D materials. Introduces historical background of SPL, including evolution of the technique and tools Explains the mechanism of sample modification/manipulation, types of AFM tips, technical parts of the experimental setup, and materials on which the technique can be applied Shows the different types of devices and structures fabricated by SPL, together with the processing steps Contains a complete and state-of-the art package of examples and different approaches, performed by different international research groups Summarizes strengths, limitations, and potential of SPL This book is aimed at advanced students, technicians, and researchers in materials science, microelectronics, and others working with lithographic techniques and fabrication processes. Cover 1 Half Title 2 Series 3 Title 4 Copyright 5 Dedication 6 Contents 8 Acknowledgements 12 Author Biographies 14 Acronyms 16 Chapter 1 Historical Background and Place in the Lithography Roadmap 18 1.1. Introduction to Nanolithography by AFM 18 1.2. Historical Background 19 1.3. AFM: The Most Versatile Tool at the Nanoscale 22 1.4. Book Scheme 23 Chapter References 24 Chapter 2 Basic Concepts and Modalities 26 2.1. The Tool: An Atomic Force Microscope 26 2.2. An Atomic Force Microscope for Lithography 28 2.3. Preparing a Scanning Probe Lithography Experiment 29 2.4. “How to Name the Technique?” 30 Chapter References 30 Chapter 3 Mechanical Scanning Probe Lithography 32 3.1. Fundamentals 32 3.2. Parameters for the Lithographic Process 33 3.3. Manipulation of Nano-Objects 35 3.4. Cleaning of 2D Materials Post-Processing 37 3.5. Applications and Proof of Concepts 39 3.5.1. Lift-Off and Pattern Transfer Processes 39 3.5.2. Templates 39 3.5.3. Charge Modulation in Quantum Devices 41 3.5.4. 2D Materials Based Devices and Patterns 42 3.5.5. Other Proof-of-Concept Devices and Nanostructures 43 Chapter References 44 Chapter 4 Dip Pen Nanolithography 50 4.1. Fundamentals 50 4.1.1. Type of Inks 50 4.1.2. Material Transport Models 51 (a) Molecular Diffusion in the Case of Diffusive Inks 51 (b) Mass Fluid Flow in the Case of Liquid Inks 51 4.1.3. Derivatives of Dip Pen Nanolithography Method 52 4.1.4. Developments on the Tool 52 4.2. Parameters for the Lithographic Process 53 4.2.1. Tip 53 4.2.2. Surface 54 4.2.3. Ink 55 4.2.4. Writing Conditions 55 4.3. Electrochemical and Thermal Dip Pen Nanolithography 56 4.4. Applications 57 4.4.1. Etching Masks and Chemical Templates 58 4.4.2. Biomolecular or Organic Molecule Patterns 60 4.4.3. Inorganic Patterns 61 Chapter References 63 Chapter 5 Field Emission Scanning Probe Lithography 70 5.1. Fundamentals 70 5.2. Parameters for the Lithographic Process 70 5.3. Towards Single-Digit Nanometer Lithography 72 5.4. Other Processes Driven by fe-SPL 75 Chapter References 76 Chapter 6 Oxidation Scanning Probe Lithography 78 6.1. Fundamentals 78 6.1.1. Oxide Growth Kinetics 80 6.1.2. Composition of the Oxides Fabricated by o-SPL 80 6.1.3. Growth of Oxides over and under the Substrate Surface 81 6.2. Parameters for the Lithographic Process 82 6.3. Tunability of o-SPL Processes: Polarity and Atmosphere 84 6.4. Applications and Proof of Concepts 85 6.4.1. Lift-Off and Pattern Transfer Processes 85 6.4.2. Templates 85 6.4.3. Barriers for Quantum Devices 88 6.4.4. Control over Metallic/Insulating State Transitions 89 6.4.5. 2D Materials Based Devices and Patterns 90 6.4.6. Other Proof-of-Concept Devices and Nanostructures 90 Chapter References 92 Chapter 7 Thermal Scanning Probe Lithography 102 7.1. Fundamentals and Components of the Tool 102 7.2. From the Millipede to the NanoFrazor 102 7.2.1. The Cantilever 103 7.2.2. The Tool and the Technique 103 7.2.3. The Resist 104 7.2.4. Markless Lithography 105 7.3. Parameters for the Lithographic Process 106 7.4. Applications and Proof of Concepts 107 7.4.1. Lift-Off and Pattern Transfer Processes 107 7.4.2. Etching Masks and Templates 107 7.4.3. Three-Dimensional Structures 110 7.4.4. 2D Materials 112 7.4.5. Physical and Chemical Conversion 113 Chapter References 114 Chapter 8 Lithography Using a Scanning Tunneling Microscope 120 8.1. Fundamentals and Parameters 120 8.2. Manipulation of Atoms and Molecules 121 8.2.1. Parallel Processes 121 8.2.2. Perpendicular Processes 123 8.2.3. Hydrogen Depassivation Lithography and Atomically Precise Manufacturing 124 8.3. Scanning Proximal Probe Lithography 127 Chapter References 127 Chapter 9 High-Throughput Strategies 132 9.1. Array of Cantilevers 132 9.2. Soft/Hard Stamps 133 9.3. Mix and Match Lithography 137 Chapter References 137 Index 142 nanolithography;,microlithography;,microelectronics;,micromachining;,NEMS;,MEMS,surface,engineering;,2D,materials nanolithography,microlithography,microelectronics,micromachining,NEMS,MEMS surface engineering,2D materials The most complete book available on scanning probe lithography (SPL), this work details the modalities, mechanisms, and current technologies, applications, and materials on which SPL can be performed. It provides a comprehensive overview of this simple and cost-effective technique, which does not require clean room conditions and can be performed in any lab or industry facility to achieve high-resolution and high-quality patterns on a wide range of materials: biological, semiconducting, polymers, and 2D materials. • Introduces historical background of SPL, including evolution of the technique and tools • Explains the mechanism of sample modification/manipulation, types of AFM tips, technical parts of the experimental setup, and materials on which the technique can be applied • Shows the different types of devices and structures fabricated by SPL, together with the processing steps • Contains a complete and state-of-the art package of examples and different approaches, performed by different international research groups • Summarizes strengths, limitations, and potential of SPL This book is aimed at advanced students, technicians, and researchers in materials science, microelectronics, and others working with lithographic techniques and fabrication processes. This work details the modalities, mechanisms, technologies, applications, and materials on which Scanning Probe Lithography can be performed. It provides an overview of this simple and cost-effective technique, which can be performed in any lab or facility to achieve high-resolution and high-quality patterns on a wide range of 2D materials.