Nanofabrication : Principles, Capabilities and Limits

This second edition of Nanofabrication is one of the most comprehensive introductions on nanofabrication technologies and processes. A practical guide and reference, this book introduces readers to all of the developed technologies that are capable of making structures below 100nm. The principle of each technology is introduced and illustrated with minimum mathematics involved. Also analyzed are the capabilities of each technology in making sub-100nm structures, and the limits of preventing a technology from going further down the dimensional scale. This book provides readers with a toolkit that will help with any of their nanofabrication challenges. Preface -- Preface to the First Edition -- Contents -- Chapter 1: Introduction -- 1.1 What Is Nanofabrication -- 1.2 Classification of Nanofabrication -- 1.3 Purpose of the Book -- Chapter 2: Nanofabrication by Photons -- 2.1 Introduction -- 2.2 Principle of Optical Projection Lithography -- 2.3 Basics of Photoresists -- 2.3.1 Process of Optical Lithography -- 2.3.2 Characteristics of Photoresists -- 2.4 Optical Lithography at Shorter Wavelengths -- 2.4.1 Deep UV -- 2.4.2 Extreme UV -- 2.4.2.1 EUV Source -- 2.4.2.2 EUV Optics -- 2.4.2.3 EUV Mask -- 2.4.2.4 EUV Resists -- 2.4.3 X-Ray Front Matter....Pages i-xvii Introduction....Pages 1-7 Nanofabrication by Photons....Pages 9-90 Nanofabrication by Electron Beam....Pages 91-148 Nanofabrication by Ion Beam....Pages 149-175 Nanofabrication by Scanning Probes....Pages 177-207 Nanofabrication by Replication....Pages 209-266 Nanoscale Pattern Transfer by Etching....Pages 267-304 Nanoscale Pattern Transfer by Deposition....Pages 305-333 Indirect Nanofabrication....Pages 335-364 Nanofabrication by Self-Assembly....Pages 365-399 Applications of Nanofabrication Technologies....Pages 401-426 Back Matter....Pages 427-432